Destruction of PFAS in the presence of silica
US12012343B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 26, 2020 |
| Grant date | Jun 18, 2024 |
| Priority date | — |
| Expiry date | Jul 16, 2041 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC02F2209/40
- WIPO fieldEnvironmental technology
- WIPO sectorChemistry
Abstract
We have discovered that heating PFAS in the presence of silica resulted in destruction of over 90% of PFAS under surprisingly mild conditions. Experimental results are presented showing that the reaction occurs along with etching of the silica glass, presumably caused by HF created during the reaction or in previous reactions. The methods of destroying PFAS are especially effective for treating relatively concentrated solutions such as those commonly encountered in AFFF waste stock and cleanup near fire-fighting training sites, as well as concentrated waste solutions from industrial sites involving the manufacture or application of PFAS.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.