Liquid detection apparatus and method of detecting liquid in wafer processing device
US12013362B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 18, 2022 |
| Grant date | Jun 18, 2024 |
| Priority date | — |
| Expiry date | May 12, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67253
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus to detect a liquid in a wafer processing device includes a first conductor proximate the wafer processing device. The apparatus includes a second conductor spaced apart from the first conductor and proximate the wafer processing device. The apparatus includes a liquid absorption material surrounding the first conductor and the second conductor. The apparatus includes a current source coupled to the first conductor. The apparatus includes a current detector coupled to at least one of the first conductor or the second conductor. The liquid absorption material establishes a conductive pathway between the first conductor and the second conductor when the liquid absorption material absorbs the liquid in the wafer processing device. A current is generated, by the current source, in at least one of the first conductor or the second conductor through the conductive pathway. The current detector detects the current.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.