Dual-cure phase-separation type photosensitive resin composition for continuous 3D printing with high precision
US12013638B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Nov 4, 2020 |
| Grant date | Jun 18, 2024 |
| Priority date | — |
| Expiry date | Aug 26, 2041 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB33Y70/00
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present disclosure relates to a dual-cure phase-separation type photosensitive resin composition for continuous 3D printing with high precision, including an acrylate having a cross-linkable double bond, a polyurethane prepolymer, a chain extender, and a photoinitiator. The polyurethane prepolymer is produced by a reaction between an isocyanate and a polyether polyol with a molecular weight larger than or equal to 4000 under heating and catalytic action. The photosensitive resin composition of the present disclosure is used in the continuous 3D printing to make high precision parts.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.