Embossing pattern with a continuous contour plateau having emboss elements thereon and products and methods of using the same
US12018438B2 · kind B2 · utility
0Cited by
49References
16Claims
0Family size
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Key dates
| Filing date | Dec 16, 2021 |
| Grant date | Jun 25, 2024 |
| Priority date | — |
| Expiry date | May 28, 2042 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB31F2201/0787
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
Embossed tissue products having improved strength and softness are disclosed. The products as described have a continuous curvilinear emboss element which carries discrete emboss elements, thereby providing the product with the softness and handfeel benefits associated with the long linear elements, but the visual appearance of discrete emboss elements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.