Projection device and projection system
US12018803B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 1, 2022 |
| Grant date | Jun 25, 2024 |
| Priority date | — |
| Expiry date | Dec 1, 2042 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF21Y2115/30
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Provided is a projection device and projection system that includes a first light source which emits a first light beam, a diffraction part on which first predetermined pattern is provided, and the diffraction part diffracts at least a part of the first light beam emitted from the first light source to form first pattern corresponding to the first predetermined pattern, and a reflection part on which one or more second predetermined patterns are provided, the reflection part reflects a second light beam incident thereon to form second pattern corresponding to the one or more second predetermined patterns, and one of the first pattern and the second pattern forms projection pattern or both of the first pattern and the second pattern are superposed to form projection pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.