Method and apparatus for determining a force applied to a sample during an optical interrogation technique
US12019014B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 14, 2022 |
| Grant date | Jun 25, 2024 |
| Priority date | — |
| Expiry date | Jul 14, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/1218
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An optical measurement system measurement system for examining a sample. The measurement system comprises an internally reflective element, a stage, an optical assembly, a chassis, and a sensor. The internally reflective element has a contact surface. The stage is positioned below the internally reflective element. The stage and the internally reflective element are configured to apply a force to the sample. The optical assembly comprises a light source and a light detector. The optical assembly is configured to scan the sample by directing source light from the light source towards the contact surface and detecting source light optically interacting with the contact surface by the light detector. The chassis is configured to support the optical assembly and the internally reflective element. The sensor is mounted to the chassis and configured to detect the force applied to the sample by the internally reflective element and the stage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.