Removal of contaminants from EUV masks
US12019368B2 · kind B2 · utility
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2References
12Claims
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Assignee
Inventor
Key dates
| Filing date | Feb 8, 2022 |
| Grant date | Jun 25, 2024 |
| Priority date | — |
| Expiry date | Dec 25, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/24
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An aqueous cleaning composition containing sulfonic acids and a source of chloride ions is used to clean contaminants from EUV masks used in the manufacture of semiconductors. Optionally, the aqueous cleaning composition can include oxidizing agents and surfactants. The aqueous cleaning composition removes tin as well as other contaminants from the mask. Such other contaminants include, but are not limited to, aluminum oxide, etch and photoresist residues.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.