System and method for controlling particles using projected light
US12020828B2 · kind B2 · utility
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10References
20Claims
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Key dates
| Filing date | Jan 3, 2020 |
| Grant date | Jun 25, 2024 |
| Priority date | — |
| Expiry date | Dec 16, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG04F5/14
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system and method for controlling particles using projected light are provided. In some aspects, the method includes generating a beam of light using an optical source, and directing the beam of light to a beam filter comprising a first mask, a first lens, a second mask, and a second lens. The method also includes forming an optical pattern using the beam filter, and projecting the optical pattern on a plurality of particles to control their locations in space.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.