Method of manufacturing an array substrate wherein static electricity is discharged from an oxide semiconductor film
US12021091B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Sep 25, 2020 |
| Grant date | Jun 25, 2024 |
| Priority date | — |
| Expiry date | Jan 8, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K59/1315
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present disclosure provides an array substrate and a preparation method thereof, belonging to the field of display technology. The preparation method of the array substrate includes: providing a base substrate; forming a common electrode bonding line on one side of the base substrate; forming an oxide semiconductor material layer, and the oxide semiconductor material layer and the common electrode bonding line are located on the base substrate on the same side, and the oxide semiconductor material layer is electrically connected to at least part of the common electrode bonding line; the oxide semiconductor material layer is patterned to form an oxide semiconductor layer with multiple active layers, and the oxide semiconductor layer is The orthographic projection on the base substrate and the common electrode bonding line overlap at most parts of the orthographic projection on the base substrate, and any active layer and the common electrode bonding line are insulated from each other. The preparation method of the array substrate can avoid electrostatic breakdown of the array substrate during the preparation process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.