Polypetide, photoresist composition including the same, and method of forming pattern using the same
US12024540B2 · kind B2 · utility
0Cited by
1References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 19, 2022 |
| Grant date | Jul 2, 2024 |
| Priority date | — |
| Expiry date | Jun 10, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0274
- WIPO fieldBiotechnology
- WIPO sectorChemistry
Abstract
A polypeptide, a photoresist composition including the polypeptide, a photoresist including the polypeptide, and a method of forming patterns using the photoresist composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.