Method of preparing metal mask substrate
US12024780B2 · kind B2 · utility
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12Claims
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Assignee
Inventors
Key dates
| Filing date | Nov 11, 2021 |
| Grant date | Jul 2, 2024 |
| Priority date | — |
| Expiry date | Nov 24, 2042 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/042
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of preparing a metal mask substrate includes providing a metal substrate. Next, a gloss is measured and obtained from the surface of the metal substrate. Next, the gloss is determined whether to be within a predetermined range. When the gloss is determined within the predetermined range, a photolithography process is performed to the metal substrate, where the predetermined range is between 90 GU and 400 GU.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.