Patent · US Active

Filling device and apparatus, electrochemical deposition system and filling method

US12024787B2 · kind B2 · utility

0Cited by
5References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 29, 2021
Grant dateJul 2, 2024
Priority date
Expiry dateJun 29, 2042

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC25D17/02
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

The present disclosure relates to a filling device and apparatus, an electrochemical deposition system, and a filling method. The filling device includes: a feeding structure including a first feed port and a first discharge port; a container including a second feed port and a second discharge port; a weighing means disposed on the container; a conveying structure disposed between the first discharge port and the second feed port, the second feed port being in communication with the first discharge port via the conveying structure, and the conveying structure being configured to convey a material output from the first discharge port to the second feed port; and a control structure connected to the weighing means and the conveying structure, respectively, and configured to control a conveying speed of the conveying structure according to the weight detected by the weighing means.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.