Structured light projection through the minimization of visual artifacts by way of deliberately introduced optical aberrations
US12025470B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 12, 2021 |
| Grant date | Jul 2, 2024 |
| Priority date | — |
| Expiry date | Jan 7, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/2545
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A triangulation device for measuring a measurement object by a projection of a structured light pattern onto the measurement object. The triangulation device includes a projector projecting the structured light pattern decomposable into different spatial frequencies onto the measurement object. The projector comprises a matrix of pixel elements and a lens system which determines a wavefront with a wavefront aberration from a reference wavefront, and a camera including a lens system and an imaging sensor, the camera being configured to receive the structured light pattern projected by the projector onto the measurement object, and a processing unit configured to provide distance information by evaluating imaging information provided by the camera. The wavefront aberration comprises a primary spherical aberration coefficient Z9, wherein the primary spherical aberration coefficient Z9 is larger than 0.5λ, wherein λ is a wavelength of the projected structured light pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.