Apparatus for trapping reaction by-product created by etching process
US12030007B2 · kind B2 · utility
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16Claims
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Key dates
| Filing date | Sep 17, 2021 |
| Grant date | Jul 9, 2024 |
| Priority date | — |
| Expiry date | Nov 11, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67069
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The present disclosure relates to an apparatus for trapping a reaction by-product created by an etching process, the apparatus being configured to trap a reaction by-product contained in an unreacted gas discharged after a process is performed in an etching process chamber during a semiconductor manufacturing process, trap and stack the reaction by-product in the form of powder at a position between a vacuum pump and a scrubber through multiple flow path switching structures, multiple trapping structures, and multiple stacking structures, and discharge only a gaseous unreacted gas to the scrubber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.