System for proximity reporting in an assembly environment
US12030669B2 · kind B2 · utility
0Cited by
3References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 15, 2021 |
| Grant date | Jul 9, 2024 |
| Priority date | — |
| Expiry date | Aug 5, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG08B21/182
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and a system can be used for reporting proximity between technicians in an assembly environment. The method includes monitoring, by a proximity server, a distance between a first proximity detector and a second proximity detector based on a first signal and a second signal. The first proximity detector is configured to generate the first signal, and the second proximity detector is configured to generate the second signal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.