Etching composition for thin film containing silver, method for forming pattern and method for manufacturing a display device using the same
US12031076B2 · kind B2 · utility
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9Claims
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Key dates
| Filing date | Mar 17, 2023 |
| Grant date | Jul 9, 2024 |
| Priority date | — |
| Expiry date | Mar 17, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/621
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An etching composition for a silver-containing thin film, the etching composition comprising an inorganic acid compound, a sulfonic acid compound, an organic acid compound, a nitrate, a metal oxidizing agent, an amino acid compound, and water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.