Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
US12032288B2 · kind B2 · utility
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Key dates
| Filing date | May 4, 2021 |
| Grant date | Jul 9, 2024 |
| Priority date | — |
| Expiry date | Jul 11, 2042 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2603/74
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
An actinic ray-sensitive or radiation-sensitive resin composition includes a compound represented by General Formula (I) and an acid-decomposable resin. M1+A−-L-B−M2+ (I)
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.