Solution-based deposition method for preparing semiconducting thin films via dispersed particle self-assembly at a liquid-liquid interface
US12040185B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 22, 2019 |
| Grant date | Jul 16, 2024 |
| Priority date | — |
| Expiry date | Feb 6, 2040 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D2401/21
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A device for coating semiconductor/semiconductor precursor particles on a flexible substrate and a preparation method of a semiconducting thin film, wherein the device includes: a container for a first and second solvent substantially immiscible; injection means for injecting a predetermined dispersion volume of at least one layered semiconductor particle material or its precursor(s), occurring at a liquid-liquid interface formed within the container and between the first and second solvent, and creating a particle film at the liquid-liquid interface; a first support means; substrate extracting means; substrate supply means; compression means, reducing a distance between particles and push the film onto the substrate, wherein the compression means includes several pushing means mounted on a drive device, wherein at least two of the several pushing means are at least partially submerged in the second solvent during drive device rotation, and moved through the second solvent toward the first support means.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.