Curable composition for use in a high temperature lithography-based photopolymerization process and method of producing crosslinked polymers therefrom
US12042353B2 · kind B2 · utility
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24Claims
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Key dates
| Filing date | Aug 8, 2022 |
| Grant date | Jul 23, 2024 |
| Priority date | — |
| Expiry date | Aug 8, 2042 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P10/25
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.