Patent · US Active

Mask, exposure method and touch panel

US12050397B2 · kind B2 · utility

0Cited by
2References
5Claims
0Family size

Assignees

Inventors

Key dates

Filing dateMar 15, 2021
Grant dateJul 30, 2024
Priority date
Expiry dateDec 26, 2041

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06F2203/04112
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A mask includes a first region and a second region. The first region includes a first light-shielding strip and a second light-shielding strip, the second region includes a third light-shielding strip, the first light-shielding strip, the second light-shielding strip is located between the first light-shielding strip and the third light-shielding strip, the first light-shielding strip, the second light-shielding strip and the third light-shielding strip are configured to shield light and bound spaces, and the spaces are configured in such a manner that light is allowed to pass through the spaces. A width of the first light-shielding strip in a first direction is larger than a width of the second light-shielding strip in the first direction, and the width of the second light-shielding strip in the first direction is larger than a width of the third light-shielding strip in the first direction.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.