Patent · US Active

Material processing apparatus and operating method thereof

US12051600B2 · kind B2 · utility

0Cited by
4References
16Claims
0Family size

Inventor

Key dates

Filing dateMar 16, 2021
Grant dateJul 30, 2024
Priority date
Expiry dateSep 7, 2041

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB01J3/04
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A material processing apparatus including a processing chamber, an external pressure source, a pressure reducer, a temperature regulator, and a controller is provided. The processing chamber has an internal space. The external pressure source is connected to the processing chamber to pressurize the internal space. The pressure reducer is connected to the processing chamber to depressurize the internal space. The temperature regulator is arranged in the processing chamber to adjust the temperature in the internal space. The controller is configured to control the external pressure source and the temperature regulator to respectively increase the temperature to a first predetermined temperature and the pressure to a first predetermined pressure, and to control the pressure in the processing chamber to rise continuously before the temperature in the processing chamber rises to the first predetermined temperature. An operating method of a material processing apparatus is further provided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.