Gas diffusion layer and method for preparing same
US12051813B2 · kind B2 · utility
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9Claims
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Key dates
| Filing date | Dec 17, 2021 |
| Grant date | Jul 30, 2024 |
| Priority date | — |
| Expiry date | Feb 13, 2043 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E60/50
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Disclosed are a gas diffusion layer and a method for preparing the same. In the preparation method, a conductive material is fed to a carbon fiber suspension slurry to obtain a carbon fiber substrate. The carbon fiber substrate is processed to obtain a conductive porous substrate. A hydrophobic layer is formed on the conductive porous substrate to obtain a hydrophobic-conductive porous substrate. Then a microporous layer is formed on the hydrophobic-conductive porous substrate to obtain the gas diffusion layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.