Deposition apparatus having mask assembly and method of repairing the mask assembly
US12054820B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 28, 2022 |
| Grant date | Aug 6, 2024 |
| Priority date | — |
| Expiry date | Apr 28, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/166
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A deposition apparatus includes a chamber, a mask assembly disposed in the chamber and including an open sheet including a first area in which a first deposition hole is defined and a second area in which a second deposition hole spaced apart from the first deposition hole is defined, a first mask including multiple deposition openings that overlap the first area, and a second mask including multiple deposition openings that overlap the second area, a deposition substrate disposed on the mask assembly, and a deposition source spraying a deposition material to the mask assembly.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.