Patent · US Active

Deposition apparatus having mask assembly and method of repairing the mask assembly

US12054820B2 · kind B2 · utility

1Cited by
13References
6Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 28, 2022
Grant dateAug 6, 2024
Priority date
Expiry dateApr 28, 2042

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10K71/166
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A deposition apparatus includes a chamber, a mask assembly disposed in the chamber and including an open sheet including a first area in which a first deposition hole is defined and a second area in which a second deposition hole spaced apart from the first deposition hole is defined, a first mask including multiple deposition openings that overlap the first area, and a second mask including multiple deposition openings that overlap the second area, a deposition substrate disposed on the mask assembly, and a deposition source spraying a deposition material to the mask assembly.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.