Valve for throttling gas flow from a semiconductor processing tool
US12055228B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 8, 2022 |
| Grant date | Aug 6, 2024 |
| Priority date | — |
| Expiry date | Apr 8, 2042 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF16K1/221
- WIPO fieldMechanical elements
- WIPO sectorMechanical engineering
Abstract
A valve for throttling gas flow from a semiconductor processing tool includes a valve body. A shaft extends through the valve body. The shaft defines an internal cavity and a first opening communicating with the internal cavity. A first deflector is positioned on the shaft proximate the first opening and directed at a first interface between the shaft and the valve body. A method for throttling gas flow from a semiconductor processing tool includes providing a gas in an internal cavity defined in a shaft of a valve and directing the gas through an opening defined in the shaft and communicating with the bore toward an interface between the shaft and a valve body of the valve supporting the shaft.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.