Spark gap structures for detection and protection against electrical overstress events
US12055569B2 · kind B2 · utility
0Cited by
19References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 15, 2023 |
| Grant date | Aug 6, 2024 |
| Priority date | — |
| Expiry date | May 15, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D89/911
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The disclosed technology generally relates to electrical overstress protection devices, and more particularly to electrical overstress monitoring devices for detecting electrical overstress events in semiconductor devices. In one aspect, an electrical overstress monitor and/or protection device includes a two different conductive structures configured to electrically arc in response to an EOS event and a sensing circuit configured to detect a change in a physical property of the two conductive structures caused by the EOS event. The two conductive structures have facing surfaces that have different shapes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.