Techniques for adjusting a beam pattern in a LIDAR system
US12055636B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 27, 2023 |
| Grant date | Aug 6, 2024 |
| Priority date | — |
| Expiry date | Apr 27, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01S17/42
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system and method receive a first beam pattern from an optical source that includes optical beams transmitted towards a target. The system and method measure a first vertical angle between at least two of the optical beams along a first axis relative to the FMCW LIDAR system. The system and method calculate a second beam pattern based on the first vertical angle and a pivot point. The second beam pattern produces a second vertical angle between the two optical beams. The system and method adjust one or more components from a first position that forms the first beam pattern to a second position that forms the second beam pattern for transmission towards the target. The system and method receive one or more return optical beams from the target, based on the second beam pattern, to produce a plurality of points to form the point cloud.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.