Photosensitive compositions, preparation methods thereof, and quantum dot polymer composite pattern produced therefrom
US12055852B2 · kind B2 · utility
0Cited by
10References
17Claims
0Family size
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Key dates
| Filing date | Apr 19, 2021 |
| Grant date | Aug 6, 2024 |
| Priority date | — |
| Expiry date | Jan 25, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/033
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive composition including: a plurality of quantum dots, wherein the quantum dot includes an organic ligand bound to a surface of the quantum dot; a photoinitiator; a binder including a carboxylic acid group; a photopolymerizable monomer having a carbon-carbon double bond; and a solvent, wherein the photoinitiator includes a first photoinitiator including an oxime compound and a second photoinitiator including at least one selected from a phosphine oxide compound and an amino ketone compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.