Method for operating a multiple particle beam system while altering the numerical aperture, associated computer program product and multiple particle beam system
US12057290B2 · kind B2 · utility
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92References
22Claims
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Key dates
| Filing date | Jan 11, 2022 |
| Grant date | Aug 6, 2024 |
| Priority date | — |
| Expiry date | Jan 28, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/1215
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method includes operating a multiple particle beam system at different working points. The numerical aperture can be set for each of the working points in such a way that the resolution of the multiple particle beam system is optimal. In the process, the beam pitch between adjacent individual particle beams on the sample to be scanned is kept constant as a boundary condition. There are no mechanical reconfigurations of the system whatsoever for the purposes of varying the numerical aperture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.