Deposition system with integrated cooling on a rotating drum
US12057297B2 · kind B2 · utility
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10References
26Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 18, 2020 |
| Grant date | Aug 6, 2024 |
| Priority date | — |
| Expiry date | Mar 18, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3321
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In one aspect, a system for depositing a film on a substrate is disclosed, which comprises at least one metallization source for generating metal atoms, and at least one reactive source for generating at least one reactive species. The system further includes an inner cooling cylinder and a substrate cylinder, where the inner cooling cylinder is fixedly positioned relative to the substrate cylinder, and the substrate cylinder at least partially surrounds the inner cooling cylinder. At least one mount is coupled to the substrate cylinder for mounting one or more substrates to the substrate cylinder.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.