Patent · US Active

Process for the preparation of synthetic quartz glass

US12060293B2 · kind B2 · utility

0Cited by

11References

7Claims

0Family size

Assignee

HERAEUS QUARZGLAS GMBH & CO. KG · DE

Inventors

Martin Thürer · Bitterfeld-Wolfen, DE
Walter Lehmann · Leipzig, DE
Martin Trommer · Bitterfeld-Wolfen, DE

Key dates

Filing date	Dec 16, 2021
Grant date	Aug 13, 2024
Priority date	—
Expiry date	Mar 31, 2042

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC03B2207/36
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

Described is a method of producing synthetic fused silica in which the synthetic flame used in the method has a ratio of the Full Width at Half Maximum (FWHMvert) vertical luminous intensity to the Full Width at Half Maximum (FWHMhori) horizontal luminous intensity greater than 10 in a targetless state, the luminous intensities being measured in candela/mm2.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.