Photocurable composition
US12065573B2 · kind B2 · utility
0Cited by
2References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 31, 2020 |
| Grant date | Aug 20, 2024 |
| Priority date | — |
| Expiry date | Nov 24, 2041 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09D11/38
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A photocurable composition can comprise a polymerizable material and an initiator. The polymerizable material can include at least one first multi-functional monomer containing an allyloxymethyl methacrylate structure in an amount at least 5 wt % and not greater than 20 wt % based on the polymerizable material. The photocurable composition can be suitable for use in inkjet adaptive planarization and may be adapted to form cured layers having a glass transition temperature of at least 120° C.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.