Method of making thin films of sodium fluorides and their derivatives by ALD
US12065738B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Oct 22, 2021 |
| Grant date | Aug 20, 2024 |
| Priority date | — |
| Expiry date | Apr 17, 2042 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E60/10
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of making thin films of sodium fluorides and their derivatives by atomic layer deposition (“ALD”). A sodium precursor is exposed to a substrate in an ALD reactor. The sodium precursor is purged, leaving the substrate with a sodium intermediate bound thereon. A fluorine precursor is exposed to the bound sodium intermediate in the ALD reactor. The fluorine precursor is purged and a sodium fluoride film is formed on the substrate.
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