Photon propagation modified additive manufacturing compositions and methods of additive manufacturing using same
US12070900B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 3, 2023 |
| Grant date | Aug 27, 2024 |
| Priority date | — |
| Expiry date | Jul 3, 2043 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E30/30
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Additive manufacturing compositions include low-absorbing particles or non-absorbing particles that have an absorbance for wavelengths of 300 nm to 700 nm that is equal to or greater than 0 Au and is less 1.0 Au, such as 0.001 Au≤absorbance≤0.7 Au. Slurries including such particles and an uranium-containing particle and that are used in additive manufacturing processes have an increased penetration depth for curative radiation. Removal of low-absorbing particles or non-absorbing particles during post-processing of as-manufactured products results in pores that create porosity in the as-manufactured product that provide a volume accommodating fission gases and/or can enhance wicking of certain heat pipe coolant liquids. Low-absorbing particles or non-absorbing particles can be functionalized for improved properties, for example, with fissionable material for improved ceramic yields, with burnable poisons or stabilizers for increased homogeneity, with stabilizers for localized delivery of the stabilizer, or with combinations thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.