Apparatus and method for element analysis of materials by means of optical emission spectroscopy
US12072291B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 14, 2019 |
| Grant date | Aug 27, 2024 |
| Priority date | — |
| Expiry date | Sep 7, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/0221
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A device may be provided for element analysis of materials by means of optical emission spectroscopy, particularly by means of laser-induced plasma spectroscopy, said device having: means for exciting a plasma from a partial quantity of a test sample made of the material to be analyzed; means for detecting and for spectral analysis of optical radiation emitted from the plasma; beam guidance means for guiding at least a part of the optical radiation emitted from the plasma to the means for detecting and spectral analysis; and means for flushing at least one partial region of the device with an inert gas, wherein the beam guidance means are at least one capillary tube, which additionally serves to guide the inert gas. A method may be provided for element analysis of materials by means of optical emission spectroscopy using the device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.