Method and apparatus for writing imageable material using multiple beams
US12072634B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 15, 2022 |
| Grant date | Aug 27, 2024 |
| Priority date | — |
| Expiry date | Mar 1, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03G15/043
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A method for writing an imageable material using multiple beams includes preparing subsequent patterns each having Y rows of N pixel locations, said subsequent patterns including first and second patterns; where the first and the second pattern overlap with each other in an overlap area consisting of O columns and Y rows of pixel locations; selecting for each row i of said first pattern Mi1 pixel locations; selecting for each row i of said second pattern Mi2 pixel locations; writing simultaneously, for each row i, said Mi1 selected pixel locations by moving the N beams in a fast scan direction relative to said imageable material; and moving said N beams relative to said imageable material in a slow scan direction over (N-O) pixel locations; writing simultaneously, for each row i, said Mi2 selected pixel locations by moving the N beams in a fast scan direction relative to said imageable material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.