Patent · US Active

Mask and mask assembly

US12075687B2 · kind B2 · utility

0Cited by
4References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 30, 2021
Grant dateAug 27, 2024
Priority date
Expiry dateMay 11, 2042

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10K71/191
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A mask includes: a body portion including a cell area, and a peripheral area surrounding the cell area, the body portion having a plurality of cell openings defined therein; and a plurality of mark patterns at the peripheral area. The cell area includes: a first area; and a second area adjacent to the first area, and the plurality of cell openings includes: first cell openings defined at the first area, and spaced from each other; and second cell openings defined at the second area, and spaced from each other. Each of the mark patterns includes at least one recess portion, and has a point-symmetrical shape with respect to a corresponding symmetry point.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.