Apparatus and method for providing ultrapure water
US12077456B2 · kind B2 · utility
0Cited by
4References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 28, 2019 |
| Grant date | Sep 3, 2024 |
| Priority date | — |
| Expiry date | Jun 2, 2039 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC02F2301/024
- WIPO fieldEnvironmental technology
- WIPO sectorChemistry
Abstract
The invention relates to an apparatus for providing ultrapure water, in particular ultrapure water for use in semiconductor fabrication.This apparatus comprises at least one cylindrical reactor with an inner cylindrical shell, an outer cylindrical shell and a channel-like volume between inner shell and outer shell.According to the invention
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.