Apparatus and methods of sublimation for repeatable uniform or patterned deposition of matrix crystals on solid substrates
US12077846B2 · kind B2 · utility
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13Claims
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Key dates
| Filing date | Nov 27, 2019 |
| Grant date | Sep 3, 2024 |
| Priority date | — |
| Expiry date | Apr 24, 2041 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/243
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
This disclosure relates to apparatus and methods for sublimation and deposition of chemicals. In particular aspects, this disclosure relates to apparatus and methods for patterned sublimation and deposition of chemicals for use in matrix assisted laser desorption ionization imaging mass spectrometry (MALDI IMS). In specific aspects, the apparatus comprises a vacuum chamber and a template comprising a planar surface containing the chemical to be sublimed, where the template is located within the vacuum chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.