Patent · US Active

Nanofabrication and design techniques for 3D ICs and configurable ASICs

US12079557B2 · kind B2 · utility

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32Claims
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Key dates

Filing dateSep 6, 2019
Grant dateSep 3, 2024
Priority date
Expiry dateNov 3, 2040

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2225/06544
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Various embodiments of the present technology provide for the ultra-high density heterogenous integration, enabled by nano-precise pick-and-place assembly. For example, some embodiments provide for the integration of modular assembly techniques with the use of prefabricated blocks (PFBs). These PFBs can be created on one or more sources wafers. Then using pick-and-place technologies, the PFBs can be selectively arranged on a destination wafer thereby allowing Nanoscale-aligned 3D Stacked Integrated Circuit (N3-SI) and the Microscale Modular Assembled ASIC (M2A2) to be efficiently created. Some embodiments include systems and techniques for the construction of construct semiconductor devices which are arbitrarily larger than the standard photolithography field size of 26×33 mm, using pick-and-place assembly.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.