Occluder generation for structures in digital applications
US12079925B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 24, 2023 |
| Grant date | Sep 3, 2024 |
| Priority date | — |
| Expiry date | Mar 24, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T17/205
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method is performed at a computing system for automatically generating an occluder, the method includes receiving an input model of the visual three-dimensional structure, the input model having a plurality of faces. The method includes simplifying the input model into an initial occluder including a plurality of candidate patches in a patch-based coarse mesh. The method includes determining a first quality metric of the initial occluder measured by a first number of pixels corresponding to objects behind the visual three-dimensional structure that are blocked by the input model and the initial occluder along a first view direction. The method includes removing one or more candidate patches associated with the first number of pixels from the initial occluder while maintaining the first quality metric above a first threshold to form the occluder for the visual three-dimensional structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.