Patent · US Active

Movement systems for sputter coating of non-flat substrates

US12080527B2 · kind B2 · utility

0Cited by
4References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 14, 2020
Grant dateSep 3, 2024
Priority date
Expiry dateFeb 10, 2041

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/3323
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A movement system is provided for moving a non-flat substrate across a sputter flux distribution without circumferentially exposing the non-flat substrate to the sputter flux distribution. The movement system is arranged for a first movement of translationally transporting the non-flat substrate along the sputter flux distribution, and a second movement of translating and/or rotating the non-flat substrate with respect to the sputter flux distribution.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.