Movement systems for sputter coating of non-flat substrates
US12080527B2 · kind B2 · utility
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4References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 14, 2020 |
| Grant date | Sep 3, 2024 |
| Priority date | — |
| Expiry date | Feb 10, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3323
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A movement system is provided for moving a non-flat substrate across a sputter flux distribution without circumferentially exposing the non-flat substrate to the sputter flux distribution. The movement system is arranged for a first movement of translationally transporting the non-flat substrate along the sputter flux distribution, and a second movement of translating and/or rotating the non-flat substrate with respect to the sputter flux distribution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.