Patent · US Active

Composition comprising a primary and a secondary surfactant, for cleaning or rinsing a product

US12084628B2 · kind B2 · utility

0Cited by

3References

13Claims

0Family size

Assignee

BASF SE

Inventors

I Chen Chou · Taoyuan, TW
Andreas Klipp · Lambsheim, DE
Berthold Ferstl · Ludwigshafen, DE

Key dates

Filing date	Nov 26, 2018
Grant date	Sep 10, 2024
Priority date	—
Expiry date	Dec 29, 2041

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/02041
WIPO fieldBasic materials chemistry
WIPO sectorChemistry

Abstract

Described is a composition comprising as primary surfactant an ionic compound comprising one or more fluoroalkyl groups and as secondary surfactant at least one non-ionic compound comprising one or more polyalkyloxy and/or polyalkylenoxy groups, for cleaning or rinsing a product, preferably a product used in the semiconductor industry, and a respective use of said composition. Further described is a method of making a cleaned or rinsed product, preferably a product used in the semiconductor industry, comprising a substrate and supported thereon a patterned material layer having line-space structures with a line width of 50 nm or below, comprising the step of cleaning or rinsing said product with the composition of the invention.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.