Semiconductor processing tool and methods of operation
US12084762B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 11, 2022 |
| Grant date | Sep 10, 2024 |
| Priority date | — |
| Expiry date | May 11, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D30/024
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Some implementations described herein provide techniques and apparatuses for determining a performance of a dry-clean operation within a deposition tool. A cleaning-control subsystem of the deposition tool may include a gas concentration sensor and a temperature sensor mounted in an exhaust system of the deposition tool to monitor the dry-clean operation. The gas concentration sensor may provide data related to a concentration of a chemical compound in a cleaning gas, where the chemical compound is a bi-product of the dry-clean operation. The temperature sensor may provide temperature data related to an exothermic reaction of the dry-clean operation. Such data may be used to determine an efficiency and/or an effectiveness of the dry-clean operation within the deposition tool.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.