Nanoparticle analysis for ultra-low level concentrations of nanoparticles in fluid samples
US12085497B1 · kind B1 · utility
0Cited by
10References
21Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Dec 29, 2023 |
| Grant date | Sep 10, 2024 |
| Priority date | — |
| Expiry date | Dec 29, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2015/1029
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Systems and methods for analyzing ultra-low level concentration nanoparticles in semiconductor cleaning chemicals by single particle inductively coupled plasma mass spectrometry (spICP-MS) are described. In aspects, the methods described herein include determination factors that are specific to each of the chemical matrix and the type of analyte associated with the nanoparticles present in a fluid sample for both a particle baseline intensity value and a nanoparticle detection threshold.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.