Semiconductor processing tool and methods of operation
US12087611B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 26, 2023 |
| Grant date | Sep 10, 2024 |
| Priority date | — |
| Expiry date | Jul 26, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6831
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Some implementations described herein provide techniques and apparatuses for a semiconductor processing tool including an electrostatic chuck having a voltage-regulation system to regulate an electrical potential throughout regions of a semiconductor substrate positioned above the electrostatic chuck. The voltage-regulation system may determine that an electrical potential within a region of the semiconductor substrate does not satisfy a threshold. The voltage-regulation system may, based on determining that the electrical potential throughout the region does not satisfy the threshold, position one or more electrically-conductive pins within the region. While positioned within the region, the one or more electrically-conductive pins may change the electrical potential of the region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.