Patent · US Active

Metal complexes for gas-phase thin-film deposition

US12091427B2 · kind B2 · utility

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Assignee

Inventors

Key dates

Filing dateMar 27, 2020
Grant dateSep 17, 2024
Priority date
Expiry dateJun 27, 2041

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC23C16/45553
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

Metal complexes of formula (I) are described: [M(L1)x(L2)y(hydra)z]n  formula (I)

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.