Patent · US Active

Dielectric material

US12091538B2 · kind B2 · utility

0Cited by

1References

20Claims

0Family size

Assignee

NATIONAL UNIVERSITY OF SINGAPORE · SG

Inventors

Chee Keong Tee · Singapore, SG
Yu Jun Tan · Singapore, SG

Key dates

Filing date	May 31, 2019
Grant date	Sep 17, 2024
Priority date	—
Expiry date	Feb 3, 2042

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC09K2211/1022
WIPO fieldBasic materials chemistry
WIPO sectorChemistry

Abstract

A dielectric material, to a device comprising the dielectric material and to use of the dielectric material in the fabrication of a device. One dielectric material may comprise a halogen-based elastomer mixed with a halogen based surfactant and exhibiting electro-mechanical self-healing properties and/or an increased dielectric constant compared to the halogen-based elastomer. Another dielectric material may comprise a halogen-based polymer mixed with a halogen based surfactant and exhibiting an increased dielectric constant compared to the halogen-based polymer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.