Substrate processing apparatus, plurality of electrodes and method of manufacturing semiconductor device
US12094735B2 · kind B2 · utility
1Cited by
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19Claims
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Key dates
| Filing date | Jun 9, 2022 |
| Grant date | Sep 17, 2024 |
| Priority date | — |
| Expiry date | Jun 9, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67017
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
There is provided a substrate processing apparatus, comprising: a reaction tube in which a substrate is processed; and a plurality of electrodes including a plurality of first electrodes to which a predetermined potential is applied and at least one second electrode to which a reference potential is applied. The at least one second electrode is arranged to be sandwiched between two sets of two or more continuously arranged electrodes of the plurality of first electrodes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.