Patent · US Active

Cleaning fluids for use in additive manufacturing apparatuses and methods for monitoring status and performance of the same

US12097709B2 · kind B2 · utility

0Cited by
75References
8Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 22, 2020
Grant dateSep 24, 2024
Priority date
Expiry dateJan 6, 2041

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB41J2002/16558
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

Embodiments of the present disclosure are directed to additive manufacturing apparatuses, cleaning stations incorporated therein, and methods of cleaning using the cleaning stations.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.