Device and method for measuring short-wavelength characteristic X-ray diffraction based on array detection

US12099025B2 · kind B2 · utility

Assignee

• THE 59TH INSTITUTE OF CHINA ORDNANCE INDUSTRY · CN

Inventors

• Lin Zheng · Shanghai, CN
• Shitao Dou · Gouli, CN
• Xin Chen · Tangxia, CN
• Lunwu ZHANG · Chongqing, CN
• Jin Zhang · Chongqing, CN
• Taibin Wu · Chongqing, CN
• Luchang Che · Chongqing, CN
• Chengzhang Wang · Chongqing, CN
• Kun Zhou · Hangzhou City, CN
• Fangchao ZHAO · Shanghai, CN
• Changguang He · Yuzhoulu, CN
• Xianhe Feng · Chongqing, CN

Key dates

• Filing date: Jun 25, 2022
• Grant date: Sep 24, 2024
• Expiry date: Jun 28, 2042

Classification

• Technology area (CPC G): Physics
• CPC primary: G21K1/025
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A device for measuring short-wavelength characteristic X-ray diffraction based on array detection, and a measurement and analysis method based on the device are provided. An array detector of the device only detects and receives a diffraction ray which is diffracted by a material of a to-be-measured part inside a sample and passes through a through hole of a receiving collimator, and rays passing through a positioning hole. The to-be-measured part inside the sample is placed at the center of the diffractometer circle of the device. The method is performed with the device. With the present disclosure, a diffraction pattern of a part inside the sample with a centimeter thickness, i.e. Debye rings, can be rapidly and non-destructively measured, thereby rapidly and non-destructively measuring and analyzing crystal structures, and its crystal structural change of the part inside the sample, such as phase, texture, and stress.